| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_421cadb30fc0074fe61126eb980d19d6 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-311
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76816
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L28-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-522
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate |
2006-10-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e69926f761f65baaaba17a635cdcf9b6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_322898ace294c41893dc08034f08bff7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_650fb057f3506034232d470089c4fe0b |
| publicationDate |
2008-04-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2008091736-A |
| titleOfInvention |
Insulating film dry etching method |
| abstract |
【Task】 In deep hole processing of an elliptical pattern, high-precision processing is performed in which the shortage of short diameter due to excessive deposition at the initial stage of etching is improved. [Solution] In an insulating film dry etching method in which a sample to be processed on which an elliptical pattern mask is formed is processed using a fluorocarbon gas, the etching step is divided into a first step and a second step from the start of etching. The polymer amount during etching is set to be smaller than that in the second step, and the first step time is controlled according to the ellipticity of the elliptic pattern (the ratio of the major axis dimension to the minor axis dimension). [Selection] Figure 4 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012195576-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010010236-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102535095-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019096785-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180099565-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020141033-A |
| priorityDate |
2006-10-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |