http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008091723-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_73ebc284a55d5daf0e209d6186c9e65c |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate | 2006-10-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b207ea31ffd2f785b23775de806d1784 |
| publicationDate | 2008-04-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2008091723-A |
| titleOfInvention | Plasma processing equipment |
| abstract | A plasma processing apparatus capable of efficiently performing surface treatment of a surface to be processed of a workpiece. A plasma processing apparatus according to the present invention performs surface processing on a surface to be processed of a workpiece with plasma, and includes a first plasma generation unit P1 and a second plasma generation unit P2 each having a pair of electrodes. Then, the first gas supply means 5 for passing the first gas G1 through the first plasma generator P1 and the second gas G2 are converted into plasma when passing through the first plasma generator P1. The second gas supply means 6 supplies the second plasma generation part P2 while being mixed with the first gas G1, and the first gas G1 and the second gas are supplied to the second plasma generation part P2. The plasma is generated from the mixed gas G containing G2, and the surface to be processed of the workpiece W is surface-treated by the plasma. [Selection] Figure 1 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9475312-B2 |
| priorityDate | 2006-10-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 24.