| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3415cdea463c93f5a5cde1d1b07e826b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e9157b5509f488a95c4aef20d8820a4f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9cf4a6a454fc8c7effdcf0f783f25a62 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-505
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B65D1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-27 |
| filingDate |
2006-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1d54b8fa76f392c63e80c594c9599cc4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0dbc69e47e1e25ee363dd3f43b858f66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_72017e00244d84e52229908f87139a33
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8e5dca2bd37e16f38773a4d7ce726884
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_347f7059a4e2b1cb4228d56dead83776
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9271974ef883d25fbe945d66c06884fb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7950b436b7845fcbc78c7d51dc0c5d9b |
| publicationDate |
2008-04-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2008088472-A |
| titleOfInvention |
Gas barrier plastic container manufacturing apparatus and manufacturing method thereof |
| abstract |
An object of the present invention is to suppress the generation of plasma outside the vacuum chamber when manufacturing a gas barrier plastic container, and further suppress the generation of foreign substances derived from a source gas. The present invention is an apparatus for forming a thin film having a gas barrier property on the inner wall surface of a plastic container. The upper end of an external electrode 1 is positioned below the zenith Y of the container 8, and An annular member 2 made of a dielectric is disposed around the outside of the container 8, and the external electrode 1 and the annular member 2 constitute a vacuum chamber 3, and the capacitance of the container itself and the capacitance of the inner space are combined. When the electrostatic capacity is C 1 and the combined electrostatic capacity of the outer space of the container among the internal spaces of the film forming unit including the internal space of the vacuum chamber and the internal space of the exhaust chamber is C 2 > C 1 > C The relationship 2 is established, and the power supply 27 supplies low frequency power having a frequency of 400 kHz to 4 MHz. [Selection] Figure 1 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009185336-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019059992-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8883257-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017101329-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016191097-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114540788-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015045039-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017172040-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2010119578-A1 |
| priorityDate |
2006-09-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |