abstract |
In a plasma generating apparatus used for processing a workpiece such as substrate modification, a plurality of plasma generating nozzles are attached to a waveguide to cope with a plurality of workpieces to be processed and workpieces having a large area. In this case, the occurrence of defects due to plasma lighting in the waveguide is suppressed. A ventilating fan 80 for pressurizing the waveguide 10 is provided, and an optical sensor 981 for detecting plasma emission in the waveguide 10 is provided, and the waveguide 10 is more than the plasma generating nozzle 31 side by the pressurization. It is difficult to cause plasma lighting in the inside, and even if lighting occurs, the control means stops the microwave generator and stops supply of the processing gas. Thereby, plasma lighting in the waveguide can be prevented, and occurrence of problems due to plasma lighting in the waveguide 10 such as wear of the receiving antenna in the plasma generating nozzle 31 can be suppressed. [Selection] Figure 1 |