| abstract |
【Task】 Provided is a negative resist composition comprising a polymer exhibiting an excellent dissolution reaction in an aqueous base developer. [Solution] A negative resist composition comprising a polymer having at least one fluorosulfonamide monomer unit having one of the following two chemical formulas: Here, in the chemical formula, M is a polymerizable skeleton portion, and Z is —C (O) O—, —C (O) —, —OC (O) —, —O—C (O) —C. (O) —O— or a linking moiety selected from the group consisting of alkyl, P is 0 or 1, and R 1 is a linear or branched alkyl group having 1 to 20 carbon atoms. , R 2 is hydrogen, fluorine, a linear or branched alkyl group having 1 to 6 carbon atoms, or a linear or branched alkyl group having 1 to 6 carbon atoms partially or wholly fluorinated And n is an integer of 1-6. [Selection figure] None |