abstract |
The present invention relates to a method of manufacturing an ultra-barrier thin film system by forming a laminated film on a substrate by vacuum thin film formation, and the laminated film is formed as an alternating film forming system composed of a smooth film and a transparent ceramic film. One smoothing film is included between two transparent ceramic films deposited by sputtering, and during deposition of the smoothing film, a monomer is put into a vacuum deposition chamber, and a magnetron plasma is formed in the deposition chamber. Actuate. |