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filingDate 2004-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2007-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2007514327-A
titleOfInvention Method to prevent damage of porous low dielectric constant materials during resist stripping
abstract Damage to a porous low dielectric constant material during resist stripping is prevented. A method of forming a shape in a porous low dielectric constant layer is provided. First, a porous low dielectric constant layer is disposed on a substrate. A patterned photoresist mask is then disposed on the porous low dielectric constant layer. The shape is then etched into the porous low dielectric constant layer. After etching the shape, a protective layer is grown on the shape. Then, the patterned photoresist mask is peeled off so that a part of the protective layer is removed, and the protective wall formed of the protective layer is left in the shape. [Selection] Figure 1
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