http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007506282-A

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filingDate 2004-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2007-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2007506282-A
titleOfInvention Method for cleaning a set of structures containing yttrium oxide in a plasma processing system
abstract A method for removing a set of particles from a set of structures comprising yttrium oxide is disclosed. The method includes exposing the set of structures to a first solution containing an oxidant for a first period. The method further includes removing the set of structures from the first solution and exposing the set of structures to a second solution containing the main reactant for a second period of time. The method further includes removing the set of structures from the second solution and polishing the set of structures with a third solution comprising the first mixture of acids for a third period. .
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