http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007502547-A
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31122 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 |
| classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-461 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-324 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-336 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00 |
| filingDate | 2004-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2007-02-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2007502547-A |
| titleOfInvention | Method and system for etching a HIGH-K dielectric material. |
| abstract | A method and system for etching a HIGH-K dielectric material. A method of heating a substrate between a first process and a second process using plasma is described. This heating method comprises thermally isolating the substrate on the substrate holder by removing the backside supply of heat transfer gas and removing the clamping force. Furthermore, an inert gas such as a noble gas is introduced into the plasma processing system and the plasma is ignited. The substrate is exposed to an inert plasma for a period of time sufficient to raise the temperature of the substrate from a first temperature (ie, typically less than 100 ° C.) to a second temperature (ie, typically on the order of 400 ° C.). It is. [Selection] |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014099659-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017046010-A |
| priorityDate | 2003-05-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24261 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457707758 |
Total number of triples: 21.