| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a3b10024b9fe3eb940006e1ae7cc8b26 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B57-02 |
| filingDate |
2006-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_46a22c511c5640def95fa08f8c54fbfc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_179693d7456a6d40c1040421cebca8eb |
| publicationDate |
2007-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2007319974-A |
| titleOfInvention |
Semiconductor polishing slurry recovery method, recovery system, regeneration method and regeneration system |
| abstract |
An object of the present invention is to provide a polishing slurry recovery method capable of efficiently separating and recovering a used polishing slurry useful for regeneration and a polishing slurry mixed with cleaning water. The conductivity or pH of a used polishing slurry stored in a slurry storage section 3 provided in a lower part of a storage tank 2 is measured by a conductivity meter 4 or a pH meter, and the obtained conductivity is obtained. Based on the rate or pH value, the semiconductor polishing slurry for regeneration and the semiconductor polishing slurry for disposal are discriminated and distributed by the air actuated valves 6a and 6b to the semiconductor polishing slurry recovery tank 7 for regeneration. A method for recovering a slurry for semiconductor polishing, wherein the polishing slurry for disposal is separated and recovered in a waste tank 8. [Selection] Figure 5 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014217904-A
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014028424-A |
| priorityDate |
2006-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |