| abstract |
A photolithographic coating composition and method are provided. In a first aspect, (a) a step of applying a curable composition on a substrate, and (b) a hard mask on the curable composition. Applying the composition; and (c) applying a photoresist composition layer over the hard mask composition, the method comprising removing one or more compositions in a process that does not include ashing. A method is provided. In the second embodiment, (a) a step of applying an organic composition on a substrate, (b) a step of applying a photoresist composition layer on the organic composition, wherein the organic composition comprises heat treatment and A method is provided that includes a step that includes a material that generates an alkali-soluble group during radiation treatment. Related compositions are also provided. [Selection figure] None |