| abstract |
An object of the present invention is to make it possible to satisfactorily perform sputtering of a target material on an inner peripheral surface or an outer peripheral surface of an extra-fine tube or a wire-like long shaft. In a vacuum vessel, a first ultralong shaft body and a second ultrathin shaft body are formed of ultrathin tubes, one of which is a sputter target along the direction of gravity and the other is a sputter target. 5 is placed on the same axis. While introducing the plasma source gas, sputtering is performed by generating harmonic ECR plasma by introducing a microwave and applying a mirror magnetic field. At this time, since the very long shafts are arranged in the direction of gravity, fluctuations in the distance between the very long shafts in the axial direction due to expansion due to thermal expansion and thinning due to sputtering can be avoided. [Selection] Figure 1 |