| abstract |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition for a photospacer having good alkali developability and having a cured product having excellent flexibility and excellent elastic recovery characteristics. SOLUTION: A hydrophilic polymer (A), a polyfunctional (meth) acrylate monomer (B), a polysiloxane (C) having two or more hydrolyzable alkoxy groups, a photo radical polymerization initiator (D), and a photo acid A photo-resin composition (Q) for a photospacer capable of alkali development containing a generator (E), wherein the polysiloxane (C) having two or more hydrolyzable alkoxy groups is represented by the general formula (1) It is preferable that it is 1 or more types of condensates (C1) of the silane compound (c1) which has a hydrolysable alkoxy group represented. R 1 m Si (OR 2 ) 4-m (1) In the formula, R 1 is an aliphatic saturated hydrocarbon group having 1 to 12 carbon atoms or an aromatic hydrocarbon group having 6 to 18 carbon atoms, R 2 is an alkyl group having 1 to 4 carbon atoms, and m is 0. It is an integer of ~ 2. [Selection figure] None |