| abstract |
A thin film forming method capable of forming a high performance and uniform thin film efficiently and at room temperature and a thin film obtained thereby. A method of forming a thin film by applying nanoparticles to a substrate and subjecting the nanoparticles applied on the substrate to an atmospheric pressure plasma treatment, the atmospheric pressure plasma treatment comprising: A gas was supplied between opposing electrodes under atmospheric pressure or a pressure near atmospheric pressure, and a high-frequency electric field was generated between the electrodes to make the gas an excitation gas, which was applied to the substrate on the substrate. A method for forming a thin film, which is a treatment for exposing the nanoparticles. [Selection figure] None |