Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-032 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-022 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-029 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
filingDate |
2005-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7f11fc2e36b0d36517caa0d5562344f7 |
publicationDate |
2007-06-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2007148208-A |
titleOfInvention |
Radiation sensitive resin composition |
abstract |
Disclosed is a new radiation-sensitive resin composition having high transparency and solvent resistance and good resolution. A cationic polymerization initiator (C) comprising a curable alkali-soluble resin (A), a quinonediazide compound (B), an onium cation, and an anion represented by formula (1) or formula (2); A radiation-sensitive resin composition containing a solvent (H). [Selection figure] None |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008256980-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4564977-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009265449-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2008126680-A1 |
priorityDate |
2005-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |