abstract |
[PROBLEMS] To provide a mold having high releasability from a photo-curing resin and excellent durability. An electron beam resist is applied to a quartz substrate having a property of transmitting ultraviolet light. A resist pattern 17a is formed by irradiation with an electron beam. Thereafter, the quartz substrate 15 is dry-etched using an etching gas such as carbon tetrafluoride to form a pattern 15 a on the quartz substrate 15. The photocatalytic titanium oxide film 11 is formed on the surface of the quartz substrate 15 on which the pattern 15a is formed by sputtering or the like, and the NIL mold 10 is manufactured. [Selection] Figure 2 |