| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 |
| filingDate |
2006-12-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6ec56380109a9c36703324b97bada4e4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9919df5aab772ce24d137f9f5c055dcb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_089bc66918c1a60a9ac390ddcbaf520d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a6b53c47200b827d6e5b29d55d4e70b8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_95140663037e19701eae26904751e23b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_01cd19963303720d983c66c36402f1e2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_31ed0e7191632a5f9009755f39fe3f4c |
| publicationDate |
2007-05-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2007123922-A |
| titleOfInvention |
Polishing method |
| abstract |
A method of polishing a substrate capable of polishing a surface to be polished such as a SiO 2 insulating film at a high speed without damage. A polishing method for polishing a substrate using an abrasive containing a slurry in which cerium oxide particles including cerium oxide particles having a crystal grain boundary and composed of two or more crystallites are dispersed in a medium. In this method, the grain boundary of the cerium oxide particles is broken by the stress of time to generate a new surface. [Selection figure] None |
| priorityDate |
1997-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |