http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007123921-A

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filingDate 2006-12-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a6b53c47200b827d6e5b29d55d4e70b8
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publicationDate 2007-05-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2007123921-A
titleOfInvention Abrasive and slurry
abstract An object of the present invention is to provide an abrasive capable of polishing a surface to be polished such as a SiO 2 insulating film at high speed without scratching. A polishing agent comprising a slurry in which cerium oxide particles are dispersed in a medium, the cerium oxide particles comprising cerium oxide particles having a crystal grain boundary composed of two or more crystallites, and having a crystal grain boundary. The cerium oxide particles are an abrasive that is 5 to 100% by volume of the total cerium oxide particles contained in the slurry. [Selection figure] None
priorityDate 1997-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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