http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007123843-A

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Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
filingDate 2006-09-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bd387bf696d3166b630a637a35eca73d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6459ccf2df5134230454a1fc1f8496fa
publicationDate 2007-05-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2007123843-A
titleOfInvention Mounting table, substrate processing apparatus, plasma processing apparatus, mounting table control method, plasma processing apparatus control method, control program, and storage medium
abstract A substrate processing apparatus capable of improving the yield of a semiconductor device is provided. A plasma processing apparatus 10 as a substrate processing apparatus includes a mounting table 35 that electrostatically attracts a wafer W mounted thereon. The plasma processing apparatus 10 directly or indirectly adjusts the temperature of the wafer W so as to be substantially equal to the target temperature based on a temperature measurement apparatus 200 that measures the temperature of the wafer W and a preset parameter. It is connected to the control device 400. The control device 400 automatically controls the temperature of the wafer W based on the measured temperature. [Selection] Figure 2
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102225682-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101576057-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8986494-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017011169-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20200036581-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150070981-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010199526-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102360230-B1
priorityDate 2005-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005136025-A
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419569951
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5416

Total number of triples: 24.