| abstract |
Provided is a plasma processing chamber structure capable of controlling the potential and simplifying the structure of the plasma processing chamber. A gas introduction shower head as a structure for a plasma processing chamber includes a disk-shaped ceiling electrode plate having a surface exposed to a processing space, and an electrode for detachably supporting the ceiling electrode plate. A cooling plate 47 which is interposed between the support 39, the ceiling electrode plate 38 and the electrode support 39, and cools the ceiling electrode plate 38 to a predetermined temperature during the plasma processing; and the cooling plate 47 and the ceiling electrode plate 38 An insulating film 48 interposed therebetween and an alumite coating 51 formed on the surface of the cooling plate 47 on the processing space S side. The ceiling electrode plate 38, the cooling plate 47, and the electrode support 39 are all made of a conductive member. Thus, the ceiling electrode plate 38 is electrically floating, and a CEL DC power source 49 is electrically connected to the ceiling electrode plate 38. [Selection] Figure 2 |