| abstract |
A water-based composition for removing residues such as but not limited to post-ash and / or post-etch photoresists from a substrate, and a method including the same. In one embodiment, the composition for removing residues comprises at least one selected from (a) water, (b) hydroxylamine, a hydroxylamine salt compound, and mixtures thereof, and (c) ) Containing a conditional corrosion inhibitor that is free of water-soluble organic acids and substantially free of added organic solvents. [Selection figure] None |