http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007101863-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 |
filingDate | 2005-10-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1a5013b97dc520e7a9178c9334a94d1a |
publicationDate | 2007-04-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2007101863-A |
titleOfInvention | Photosensitive resin composition, photosensitive element, method for producing resist pattern, and method for producing printed wiring board |
abstract | A photosensitive resin composition having high sensitivity and excellent resolution, adhesion, and mandrel characteristics (resist flexibility after curing), a photosensitive element using the same, a method for producing a resist pattern, and a printed wiring board It is to provide a manufacturing method. SOLUTION: (A) Binder polymer, (B) Ethylenically unsaturated photopolymerizable monomer, (C) Photopolymerization initiator and sensitizer, (D) Plasticizer, main skeleton is (B) ethylenic A photosensitive resin composition comprising an unreactive (saturated) compound having the same or similar to an unsaturated photopolymerizable monomer and a derivative thereof. [Selection figure] None |
priorityDate | 2005-10-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 70.