| abstract |
[PROBLEMS] To provide a resist layer patterned by photolithography, which has good elasticity and flexibility required for a sandblast resist, and excellent adhesion to a substrate surface, and has good alkali developability and peeling. Provided is a photosensitive resin composition for sandblast resist that has a short time. An aqueous alkali soluble binder polymer compound, a photopolymerizable oligomer, a photopolymerization initiator, and an additive, wherein the photopolymerizable oligomer is a polyalkylene glycol mono (meth) having a terminal alkyl group. A photosensitive resin composition for sandblast resist, comprising at least one of an acrylate compound and a polyalkylene glycol di (meth) acrylate compound. |