http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007086374-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41J2-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2005-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d11e86da5c7ac12356535350385a40ed http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_920c70b4910a47b6b994e7c568d5653b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f558258f4c7aa00ddeaa28cbf90250fe http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0edd39870ab4a302d7e66d720e93eb2c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ad9bf50d1f42b1c0c557fa66a8b50d1d |
| publicationDate | 2007-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2007086374-A |
| titleOfInvention | Pattern formation method |
| abstract | In exposure using a digital exposure apparatus including an exposure head in which drawing units are two-dimensionally distributed, a protective film, an insulating film, and a solder are obtained by uniformizing the amount of light of each drawing unit while suppressing cost. A permanent pattern forming method capable of forming a fine permanent pattern such as a resist pattern with high accuracy is provided. A photosensitive layer is irradiated with a light beam emitted from a light irradiation unit via a condensing optical system having a light distribution correction unit, and the light beam modulated by the light modulation unit is irradiated for exposure. At least, the exposure has a distribution in the amount of light within the irradiation area of the light beam irradiated from the light irradiation means to the light modulation means, and the light beam modulated by the light modulation means The permanent pattern forming method is characterized in that the light amount distribution is corrected so as to be uniform on the exposed surface of the photosensitive layer. [Selection] Figure 10 |
| priorityDate | 2005-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 1103.