http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007086215-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2ed0897e087fa147bc2eb075dbc8b9c1 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-037 |
| filingDate | 2005-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c742ad4a9f589c599aeff25b92a21af0 |
| publicationDate | 2007-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2007086215-A |
| titleOfInvention | Photosensitive resin composition |
| abstract | PROBLEM TO BE SOLVED: To provide a photosensitive resin composition excellent in film thickness uniformity at the time of forming a thin film and a covering property of a substrate edge part, and a method for producing a cured relief pattern using the composition. A composition comprising (A) a polyamide having the structure of the general formula (1), (B) a photoacid generator, and (C) an organic solvent, wherein (C) propylene occupies the organic solvent. A photosensitive resin composition, wherein the total content of glycol monomethyl ether acetate and ethyl lactate is 10% by weight or more and 60% by weight or less based on the total amount of (C) the organic solvent. [Selection figure] None |
| priorityDate | 2005-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 196.