http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007080846-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3cfa11ef6f0c5577b4612b415ff30253 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 |
filingDate | 2005-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bfdd5835bd0994a392b48f707bd26c61 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4c8cbcfcfd33ac141c5044fa35a15603 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_50b0a84ea91e8ef8cf0bffcc0542128f |
publicationDate | 2007-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2007080846-A |
titleOfInvention | Gas dispersion plate and manufacturing method thereof |
abstract | An inexpensive gas dispersion that has high corrosion resistance to a halogen-based corrosive gas and its plasma, can prevent generation of particles from gas holes, and can contribute to improvement of yield in manufacturing semiconductor devices. Provide a plate. In the gas dispersion plate 1, one or many gas holes 3 are provided in a base material 2 made of Y 2 O 3 ceramic having a relative density of 96% or more, and an edge portion 4 of the gas hole 3 is sandblasted. It is processed into an R shape of R0.2 mm or more by processing. [Selection] Figure 1 |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010150575-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113165139-A |
priorityDate | 2005-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Predicate | Subject |
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isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID962 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419512635 |
Total number of triples: 17.