http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007080846-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3cfa11ef6f0c5577b4612b415ff30253
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
filingDate 2005-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bfdd5835bd0994a392b48f707bd26c61
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4c8cbcfcfd33ac141c5044fa35a15603
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_50b0a84ea91e8ef8cf0bffcc0542128f
publicationDate 2007-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2007080846-A
titleOfInvention Gas dispersion plate and manufacturing method thereof
abstract An inexpensive gas dispersion that has high corrosion resistance to a halogen-based corrosive gas and its plasma, can prevent generation of particles from gas holes, and can contribute to improvement of yield in manufacturing semiconductor devices. Provide a plate. In the gas dispersion plate 1, one or many gas holes 3 are provided in a base material 2 made of Y 2 O 3 ceramic having a relative density of 96% or more, and an edge portion 4 of the gas hole 3 is sandblasted. It is processed into an R shape of R0.2 mm or more by processing. [Selection] Figure 1
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010150575-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113165139-A
priorityDate 2005-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID962
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419512635

Total number of triples: 17.