| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_294881271413951a95f284b588a68e66 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E60-50 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01M4-88 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J23-74
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-786
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B31-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J37-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J37-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-336 |
| filingDate |
2005-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fc4ec8acaa6fed61a55c642086830ded
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_34bfe571b0b8417d6c46b80e3609e630
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a3dcfa6777d2ec77ddad84b5ad5ea8a7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e74c28a3f992b9a0ede70e81d6c3ea2c |
| publicationDate |
2007-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2007063034-A |
| titleOfInvention |
Method for producing linear carbon material and method for producing functional device |
| abstract |
PROBLEM TO BE SOLVED: To provide a linear carbon material that enables PECVD at a low temperature and can be implemented at low cost using a glass substrate or the like, and a method for manufacturing a functional device. In a method for producing a linear carbon material in which a raw material gas (for example, CH 4 ) made of a compound containing carbon is made into plasma using a catalyst to grow a linear carbon material such as SWCNT, a reducing gas (for example, H 2 ) generating a plasma and treating the catalyst with the plasma (procedure 4), and generating a plasma of the source gas to grow the linear carbon material (procedure 5). ). When the PECVD reaction is performed in the source gas plasma, the catalyst surface is treated with a reducing gas plasma prior to the generation of the source gas plasma to maintain a high catalytic activity. [Selection] Figure 1 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007252970-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8323439-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2012029234-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010212619-A |
| priorityDate |
2005-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |