http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007051299-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2f8cfa5aee4410611b5c562275c9f8e3 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-28 |
| filingDate | 2006-10-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_04ef3fbcd42c69ed88de493fd73d2dfa http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d98780d4f281f144090850a4c87d5668 |
| publicationDate | 2007-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2007051299-A |
| titleOfInvention | Polymer compound for photoresist and resin composition for photoresist |
| abstract | PROBLEM TO BE SOLVED: To obtain a polymer compound that does not adversely affect resist performance when used as a resin component of a resin composition for photoresist. The photoresist polymer compound of the present invention is a photoresist polymer compound that becomes alkali-soluble by the action of an acid, and the monomer content as an impurity in the polymer is 2% by weight or less. It is characterized by. Such a photoresist polymer compound is precipitated or reprecipitated by supplying a solution of a photoresist polymer compound that becomes alkali-soluble by the action of an acid into a poor solvent from a nozzle having a diameter of 6 mmφ or less. Can be manufactured. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2007116614-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013006888-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009292983-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012001625-A |
| priorityDate | 2006-10-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 108.