http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001142213-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 1999-11-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_601ba4a71019c4ad5d4dff3748ba6624 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e8c6788d846774f20e5ac920e2e11e3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_abf92c6162f276a54a5782dd87f205c1 |
| publicationDate | 2001-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2001142213-A |
| titleOfInvention | Positive photoresist composition |
| abstract | PROBLEM TO BE SOLVED: To provide a positive photoresist composition which has solved the problems of development defect generation and scum generation during development, and has an excellent pattern density dependency and improved pattern edge roughness. A positive photoresist composition for deep ultraviolet exposure. (A) A compound which generates an acid upon irradiation with actinic rays or radiation, and (B) (I-1) to (I- 4) a resin containing a repeating unit having a group represented by at least one of the above, which is decomposed by the action of an acid to increase the solubility in alkali, and (C) a fluorine-based resin and / or Or it contains a silicon-based surfactant. R 1 to R 5 may be the same or different, and include a hydrogen atom, Represents an alkyl group, a cycloalkyl group or an alkenyl group which may have a substituent. Two of R 1 to R 5 may combine to form a ring. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7514201-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6808860-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7977029-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007051299-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6461788-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002031890-A |
| priorityDate | 1999-11-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 326.