| abstract |
The present invention relates to an etching solution composition, a conductive film patterning method using the same, and a flat panel display manufacturing method. The present invention relates to an etching solution composition, a conductive film patterning method using the same, and a flat panel display manufacturing method, wherein the etching solution composition contains phosphoric acid, nitric acid, acetic acid, water, and an additive. The agent includes a chlorine compound, a nitrate compound, a sulfate compound, and an oxidation regulator. In addition, by providing a method of manufacturing a flat panel display by performing a process of patterning gate electrodes, source / drain electrodes, and pixel electrodes made of different conductive materials using the etchant composition, Further simplification can be expected, and reduction in production cost and improvement in productivity can be expected. [Selection] Figure 12C |