| abstract |
The present invention relates to a photosensitive paste composition used for various members of a flat panel display, a ceramic multilayer substrate for high-frequency radio, and the like, and achieves both a pattern processing property by photolithography prescription and a shape retention property at the time of firing, and a pot life of the paste. Provides a good photosensitive paste composition. A photosensitive paste composition comprising at least one photosensitive organic component selected from the following A) to C), inorganic particles, and cage silsesquioxane. A) an ethylenically unsaturated group-containing compound and a photopolymerization initiator, B) one or more cationically polymerizable compounds selected from the group consisting of glycidyl ether compounds, alicyclic epoxy compounds, oxetane compounds, and photocationic polymerization initiators, C) One or more compounds selected from quinonediazide compounds, diazonium compounds, and azide compounds. [Selection figure] None |