| abstract |
An etching composition capable of etching each metal layer in each mask process composed of aluminum, molybdenum, indium tin oxide, or the like is provided. Further, the present invention provides a method for manufacturing an array substrate for a liquid crystal display device that has a simple process, is inexpensive to manufacture, and can improve productivity. 40 to 70% by weight phosphoric acid, 3 to 15% by weight nitric acid, 5 to 35% by weight acetic acid, 0.05 to 5% by weight chlorine compound, 0.01 to 5% by weight chlorine stabilizer An etching composition containing 0.01 to 5% by weight of a pH stabilizer and a remaining amount of water. Moreover, it is set as the manufacturing method of the array substrate for liquid crystal display devices which etches each metal layer using the said etching composition. [Selection] Figure 3A |