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filingDate 2005-06-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4c7517fe04d118e639399933fbceb783
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cd647d4868b051b2ec3cceb5d524b729
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publicationDate 2006-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2006347834-A
titleOfInvention Method for producing metal fluoride single crystal
abstract PROBLEM TO BE SOLVED: To easily and stably produce a metal fluoride single crystal having a good VUV transmittance and useful as an optical material for next-generation photolithography technology. When producing a melt growth method such as the Czochralski method), before introducing the metal fluoride raw material into the single crystal growth furnace, the inside of the furnace to be used is composed of metal fluoride whose electronegativity is targeted. A step of heating in the presence of a fluoride of an element larger than a metal element and smaller than oxygen and capable of reacting with water is provided. For example, when producing a single crystal of calcium fluoride, since the electronegativity of Ca is 1.0 and the electronegativity of oxygen is 3.5, zinc having an electronegativity of 1.6, 1.8 The furnace is heated in the presence of fluorides such as lead and 2.5 carbon. The product resulting from the heating is preferably discharged out of the system by vacuum exhaust or the like. Thereafter, a calcium fluoride raw material is put into the furnace to produce a single crystal. [Selection] Figure 4
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type http://data.epo.org/linked-data/def/patent/Publication

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