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filingDate 2005-02-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1092e47cdbf982c23df60bf477726b92
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publicationDate 2006-08-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2006216658-A
titleOfInvention Method for manufacturing thin film semiconductor device
abstract PROBLEM TO BE SOLVED: To provide a method capable of producing a thin film semiconductor device having a controlled plane orientation and having a single-crystal crystal structure and thereby excellent electrical characteristics (semiconductor characteristics) such as mobility. SOLUTION: A step of forming a base film 2 on a substrate 1, a step of arranging a catalyst metal 3 for promoting crystallization of silicon on the base film 2 in a dot shape, a substrate 1 covering the catalyst metal 3 on the substrate 1 And forming a metal silicide 5 by reacting the amorphous silicon film 4 with the catalytic metal 3 and heating the amorphous silicon film 4 on which the metal silicide 5 is formed. Solid-phase growth to form solid-phase growth grains 6, and melt and crystallize amorphous silicon film 4 to form single-crystal silicon grains 7 having a predetermined plane orientation. Forming the seed crystal as a seed crystal. [Selection] Figure 1
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016516286-A
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Total number of triples: 34.