http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006171440-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L101-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-00 |
| filingDate | 2004-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1a6417c733f391adb9743a3708f94efe |
| publicationDate | 2006-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2006171440-A |
| titleOfInvention | Positive resist composition for electron beam or EUV and method for forming resist pattern |
| abstract | PROBLEM TO BE SOLVED: To provide an electron beam or EUV positive resist composition and a resist pattern forming method capable of suppressing defects and having excellent lithography properties such as sensitivity and resolution. An alkali-soluble structural unit (a1) containing a structural unit (a11) derived from (α-methyl) hydroxystyrene, and an acid dissociable, dissolution inhibiting group (II) represented by the following general formula (II) ) And / or a resin component (A2) having a structural unit (a2) having an acid dissociable, dissolution inhibiting group containing a specific chain acid dissociable, dissolution inhibiting group (III), and an acid that generates an acid upon exposure to light A positive resist composition for electron beam or EUV comprising a generator component (B) and a phenol compound (C) having a phenolic hydroxyl group and having no acid dissociable, dissolution inhibiting group and having a mass average molecular weight of 250 to 1000 object. [Chemical 1] [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190010561-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015219246-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9268225-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9052600-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20130026992-A |
| priorityDate | 2004-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 274.