| abstract |
Kind Code: A1 A variety of metal oxide thin films, particularly composite metal oxide thin films made of different types of metals, are produced using an ALD method without affecting the film formation rate. A hydrolyzable metal compound is used as a raw material gas, and a metal salt hydrate is used as an oxidant gas. Then, the source gas and the oxidant gas were alternately supplied into the reaction chamber where the substrate was placed via the purge gas, and a metal oxide thin film was formed on the substrate. [Selection] Figure 2 |