| abstract |
A substrate holding member capable of easily transferring heat from a plasma atmosphere to a wafer immediately after plasma generation, suppressing an increase in the wafer temperature, and shortening a time until the wafer surface temperature reaches a steady state. provide. A substrate holding member (1) in which one main surface of a plate-like substrate (2) has a mounting surface (2a) on which a wafer (W) is placed, and the other main surface is bonded to one main surface of a plate-shaped base (7), The pedestal 7 is made of a material having a higher thermal conductivity than the plate-like substrate 2, and a ring-shaped recess 7 a is formed at the center of the other main surface. [Selection] Figure 1 |