http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006154403-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d93502a23a72b56472bc75854cfe7c60 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 |
| filingDate | 2004-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d4e50e43b371da57463833cc1780df11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb9df332f02eed3f0dcdb9972eb7bda4 |
| publicationDate | 2006-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2006154403-A |
| titleOfInvention | Pattern formation method |
| abstract | Kind Code: A1 A method of forming a resist pattern having a halftone pattern portion using a photosensitive resist composition, the pattern forming method being excellent in residual film thickness exposure margin and dry etching resistance of the halftone pattern portion. provide. (A) (A) a step of applying a photosensitive resist composition containing an alkali-soluble resin, (B) a quinonediazide group-containing compound and (C) a solvent to a substrate to form a resist film; (b) In the resist pattern forming method including the step of exposing the resist film through a mask having a halftone portion, and (c) developing the resist film after bringing the resist film into contact therewith, the photosensitivity used in the step (a) The alkali-soluble resin which is the component (A) of the photosensitive resist composition is a novolak resin obtained using naphthol. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012247801-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5907316-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015232688-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2015190233-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016075937-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8940470-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2008143095-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5093525-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012253350-A |
| priorityDate | 2004-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 302.