| abstract |
[PROBLEMS] To provide a composition suitable as a positive resist having a good side lobe margin and effectively suppressing the occurrence of scum when forming a C / H pattern. (A) An alkali-soluble novolak resin, (B) a phenolic low-molecular compound, and (C) a compound represented by the following formula: A radiation-sensitive resin composition comprising at least one quinonediazidesulfonic acid ester compound of a phenolic compound represented by the formula: |