http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006073576-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_74973199515dbabd2310245aab03e282 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 |
filingDate | 2004-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_db29e77677343090b291c004781db341 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fc38a0df090bca20f262b311f90be88c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dab86dd26153aa4258e829d140d32178 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c6b100d54253923ad1327e3d29869da7 |
publicationDate | 2006-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2006073576-A |
titleOfInvention | Plasma CVD apparatus and cleaning method thereof |
abstract | A plasma CVD apparatus capable of improving productivity and a cleaning method therefor are provided. A plasma CVD apparatus cleaning method includes (A) a step of introducing a fluorine-based gas 61 into a film forming chamber 10. (B) supplying high-frequency power to the discharge electrode 20 so that the voltage distribution on the discharge electrode 20 is substantially uniform; and (C) the maximum point MP of the voltage distribution on the discharge electrode 20 is the first And a step of supplying high-frequency power to the discharge electrode 20 so as to reciprocate across an intermediate point C between the feeding point 25A and the second feeding point 25B. The supplying step (C) is executed following the supplying step (B). [Selection] Figure 3 |
priorityDate | 2004-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 20.