| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d72711e97d894c55af805c9de2053ab |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-265
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate |
2005-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_92e7710475420c56168894017da09be8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_011ab4ec793e9fa2303bcf8efc110ec7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e967c981e5adc9af89897347f1e8cde3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9090cf5fe2219d9a9341c72b022adef7 |
| publicationDate |
2006-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2006072326-A |
| titleOfInvention |
Compositions and processes for immersion lithography |
| abstract |
A barrier layer composition applied over a photoresist composition suitable for immersion lithography processing and a method of processing a photoresist composition for immersion lithography processing. (A) a step of applying a photoresist composition on a substrate; (b) a barrier containing one or more components other than a resin having a fluorinated backbone substitution on the photoresist composition; A method of treating a photoresist composition, comprising the step of applying a layer composition (c) immersing the photoresist layer in radiation that activates the photoresist composition. [Selection figure] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7985534-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7998655-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8017298-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8852847-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8017304-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008309878-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8034547-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9458343-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8895225-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9465298-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4590431-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8476001-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9176386-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8530148-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006023699-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4831777-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8088557-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8951718-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8603733-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8632942-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4606136-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8227183-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8637229-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8241840-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006337996-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9291904-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9046782-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2031446-A1 |
| priorityDate |
2004-07-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |