| abstract |
【the purpose】 High-sensitivity and inexpensive photoacid generator can be used, high resolution is obtained with near-ultraviolet exposure and weak alkali development, it can be used with substrates with through holes, and exposure with near-ultraviolet light is developed with a weak alkali developer. Thus, a positive photosensitive resist composition capable of fine pattern processing with high resolution is provided. 【Constitution】 A positive photosensitive material comprising a photoacid generator having at least one 4,6-bis (trichloromethyl) -s-triazine group in one molecule, an organic amine compound, and an acid-sensitive copolymer. Resist composition. [Selection figure] None |