| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3d737e5c03cc0e799d0f78239e9eebf0 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24802 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02054
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07H21-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07H21-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3205 |
| filingDate |
2004-12-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c8ac8facc05ca0ede1b63187317aaf2e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b22d6f3f5474506d98664e91e00b4e21
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3be95f8474a675e274ce9dc62f443328 |
| publicationDate |
2005-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2005244173-A |
| titleOfInvention |
Method for activating silicon surface, molecular pattern generated thereby and method for using the molecular pattern |
| abstract |
A method for printing and patterning molecules on a silicon surface at high speed using a microcontact printing method is provided. A surface having an oxide film on a silicon substrate is made into a hydrogen-terminated surface by HF treatment, an activated silicon surface is obtained by cyanuric chloride treatment, and a stamp with ink containing nucleophilic acid is pressed against this surface. Perform pattern transfer. After washing with the solvent used in the ink, the remaining activated silicon surface is passivated by exposure to molecules containing nucleophilicity. [Selection] Figure 1 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010505264-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006210844-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2019514213-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4614330-B2 |
| priorityDate |
2003-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |