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publicationDate 2005-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2005146420-A
titleOfInvention High purity indium
abstract High-purity indium is recovered from indium-containing materials such as ITO target scraps by a simple process. An indium-containing material is dissolved in hydrochloric acid, and an alkali is added to the solution to neutralize the solution to a predetermined value within a range of 0.5 to 4, and a predetermined metal in the solution is obtained. Ions are deposited and removed as hydroxides, then hydrogen sulfide gas is blown into them, and metal ions harmful to the electrolysis of the next step are deposited and removed as sulfides. Electrolytically collect. By this method, indium having a purity of 99.999% or more can be recovered from the ITO target scrap. [Selection] Figure 1
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