Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a665d61597c2731ab4130971ee397dc9 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
filingDate |
2003-10-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7ac4a6179aefdc933f6088105a66f464 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb5551cf2f56afd4fba6c37d36564a1c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f87b546582f582b5758d8088de2675b2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8cb3be233c7f0252d29640a76820b610 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e50d403e5f8f3a4c49252d0734d47a45 |
publicationDate |
2005-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2005116987-A |
titleOfInvention |
Polishing composition |
abstract |
PROBLEM TO BE SOLVED: To provide a polishing composition capable of suppressing the occurrence of dishing and maintaining a high polishing rate for a metal material containing copper. The polishing composition contains the following components (a) to (f). (A): Silicon oxide (b): At least one selected from carboxylic acid and α-amino acid (c): Anticorrosive agent (d): Surfactant (e): Persulfate (f): Water Further, for polishing The composition contains ammonium ions and the pH is set to 7 or more and less than 12. This polishing composition is used for polishing a semiconductor substrate. [Selection figure] None |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010062434-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8956430-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2014013977-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8202445-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8277681-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005175218-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2464852-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014013977-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2464852-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104471016-A |
priorityDate |
2003-10-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |