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filingDate 2003-10-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7ac4a6179aefdc933f6088105a66f464
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publicationDate 2005-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2005116987-A
titleOfInvention Polishing composition
abstract PROBLEM TO BE SOLVED: To provide a polishing composition capable of suppressing the occurrence of dishing and maintaining a high polishing rate for a metal material containing copper. The polishing composition contains the following components (a) to (f). (A): Silicon oxide (b): At least one selected from carboxylic acid and α-amino acid (c): Anticorrosive agent (d): Surfactant (e): Persulfate (f): Water Further, for polishing The composition contains ammonium ions and the pH is set to 7 or more and less than 12. This polishing composition is used for polishing a semiconductor substrate. [Selection figure] None
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