| abstract |
[PROBLEMS] To provide good flammability, no problem in human accumulation, high acid acidity and boiling point of acid, moderately short acid diffusion length in resist film, and dependence on mask pattern sparse density Is a novel acid generator capable of forming a resist pattern having a small and excellent smoothness, a sulfonic acid generated from the acid generator, a sulfonyl halide compound useful as a raw material for synthesizing the acid generator, and the acid generator A radiation-sensitive resin composition containing an agent is provided. An acid generator has a structure represented by the following general formula (I). [Chemical 1] [However, R 1 represents a monovalent substituent such as an alkoxycarbonyl group, an alkylsulfonyl group, or an alkoxysulfonyl group, m is 0 or an integer of 1 to 10, and n is an integer of 1 to 5. ] In addition to the acid generator, the radiation-sensitive resin composition contains an acid-dissociable group-containing resin in the positive type and an alkali-soluble resin and a crosslinking agent in the negative type. [Selection figure] None |