http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005104956-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D317-72 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D319-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C381-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D333-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D493-04 |
| filingDate | 2003-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1ad08812ff90fc207f4f27c5a0bffd60 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9c26f78710acf84023fb4c2016b1f027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_30a39e540e419bb09c6cc76ad65e7dc9 |
| publicationDate | 2005-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2005104956-A |
| titleOfInvention | Radiation sensitive acid generator, onium salt compound and positive radiation sensitive resin composition |
| abstract | PROBLEM TO BE SOLVED: To provide a radiation-sensitive acid generator (for a photoresist) used for a radiation-sensitive resin composition having excellent storage stability and pattern shape and having high sensitivity and high resolution, and suitable for the radiation-sensitive acid generator. Provided is a positive radiation sensitive resin composition containing an onium salt compound and the radiation sensitive acid generator. A radiation-sensitive acid generator contains an onium salt compound having a cation moiety represented by the general formula (1). [Chemical 1] [Wherein, A is I or S, m is an integer of 1 or more, n is an integer of 0 or more, x is an integer of 1 to 15, Ar 1 and Ar 2 are monovalent (substituted) aromatic hydrocarbon groups, etc. R represents a (substituted) alkyl group, a monovalent (substituted) alicyclic hydrocarbon group, and the like. ] The onium salt compound is composed of a compound in which a cation moiety is represented by the general formula (1), and R in the formula is a (substituted) alicyclic hydrocarbon group. The positive radiation sensitive resin composition contains (A) the radiation sensitive acid generator and (B) an acid dissociable group-containing resin. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007084594-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011081044-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011016746-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011016970-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016210765-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101399681-B1 |
| priorityDate | 2002-12-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
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