| abstract |
Provided is a positive electron beam, X-ray or EUV light resist composition having improved sensitivity, resolution, and improved line edge portion shape (line edge roughness). A positive electron beam comprising a resin having an acid-decomposable group having a specific structure, which is decomposed by the action of an acid and has increased solubility in an alkaline developer, and a compound capable of generating an acid upon irradiation with actinic radiation. , X-ray or EUV light resist composition and pattern forming method using the same. [Selection figure] None |