| abstract |
PROBLEM TO BE SOLVED: To be particularly suitable as a chemically amplified resist which is sensitive to far-ultraviolet rays and charged particle beams such as electron beams, has excellent resolution performance and pattern shape, and has particularly small nano-edge roughness. Provided is a radiation-sensitive resin composition. SOLUTION: The radiation-sensitive resin composition comprises (A) 2, 4,6-trimethylphenyldiphenylsulfonium 2,4-difluorobenzenesulfonate, 2,4,6 A radiation-sensitive acid generator represented by -trimethylphenyldiphenylsulfonium 4-trifluoromethylbenzenesulfonate and the like; and (B) a part of hydrogen atoms of phenolic hydroxyl groups in poly (p-hydroxystyrene) is 1- It contains a resin having an acetal structure typified by a resin substituted with an ethoxyethyl group or a 1-ethoxyethyl group and a t-butoxycarbonyl group or a t-butyl group. |