http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005075824-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C381-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-19 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-80 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C23-38 |
| filingDate | 2003-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1ad08812ff90fc207f4f27c5a0bffd60 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9c26f78710acf84023fb4c2016b1f027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bd119f1642e04eb5f8f09343c2cb4371 |
| publicationDate | 2005-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2005075824-A |
| titleOfInvention | Acid generator, sulfonic acid and derivatives thereof, halogen-containing norbornane compound and radiation-sensitive resin composition |
| abstract | [Problem] There is no problem in combustibility and human accumulation, the acidity and boiling point of the acid generated is high, the acid diffusion length in the resist film is moderately short, especially the dependence on the sparse density of the mask pattern Is a novel acid generator capable of forming a resist pattern having a small size and improved nano edge roughness, a sulfonic acid generated from the acid generator, a sulfonic acid derivative useful as a raw material for synthesizing the acid generator, and the like A radiation-sensitive resin composition containing the compound and the acid generator is provided. An acid generator has a structure represented by the following general formula (I). [Chemical 1] [Wherein R 1 represents a monovalent substituent such as an alkoxyl group, an alkoxycarbonyl group, an alkylsulfonyl group or an alkoxysulfonyl group, m is an integer of 0 or more, and n is 1 or 2. ] In addition to the acid generator, the radiation-sensitive resin composition contains an acid-dissociable group-containing resin in the positive type and an alkali-soluble resin and a crosslinking agent in the negative type. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007052346-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4695941-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8808975-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009191054-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005148291-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010164958-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7803511-B2 |
| priorityDate | 2003-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 576.